LIGA resist 是在PMMA基礎上開發的厚膜光阻，其中PMMA的分子量為410K。另外，可以根據客戶的具體需求來生產其他分子量的LIGA製程光阻。主要用於LIGA製程和X-Ray 曝光製程。厚度從10~250µm不等，圖形剖面垂直。

The resists of series LIGA 10.12 - 19 are positive resists on a PMMA-base to produce thicker PMMA layers. They are designed for applications in LIGA technique and mask production in x-ray lithography. The image of the structures is excellent with absolutely vertical resist flanks. PMMA resists have a good adhesion on titan oxide. Film thickness from 10 - 250 µm can be realised. Resist layers can be developed in safer solvents. The resist consists of high molecular polymethyl methacrylate (PMMA) in a safer-solvent with main components propylene glycol methyl ether acetate.

穿戴式應用添柴薪　MEMS感測器需求增溫



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